CHARACTERIZATION OF ION-IMPLANTED SI-MOLECULAR BEAM EPITAXY FILM

被引：0
|
作者：
LIU, J
BELLAVANCE, D
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 03期
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D O I：
10.1116/1.583778
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
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页码：742 / 742
页数：1
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