EFFECTS OF SIASBEAS INTERFACE STRUCTURE ON THE INITIAL-STAGES OF GAAS MBE GROWTH ON SI(111)

被引:4
|
作者
MAEHASHI, K
HASEGAWA, S
NAKASHIMA, H
机构
[1] The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka, 567
关键词
D O I
10.1016/0022-0248(93)90585-K
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We propose a new interface structure of SiAsBeAs for eliminating the charge imbalance of GaAs on Si. We studied the effects of this chalcopyrite-type interface structure on the initial stages of GaAs MBE growth on Si (111) surfaces using RHEED and UPS measurements. It is found that GaAs growth proceeds in a layer-by-layer mode at the initial stages on this charge balanced surface.
引用
收藏
页码:98 / 101
页数:4
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