HIGH PRODUCTION SYSTEM FOR DEPOSITION OF SILICON-NITRIDE

被引:6
|
作者
WOHLHEITER, VD
WHITNER, RA
机构
关键词
D O I
10.1149/1.2404373
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:945 / +
页数:1
相关论文
共 50 条
  • [21] SILICON-NITRIDE
    AUTL, NN
    YECKLEY, RL
    AMERICAN CERAMIC SOCIETY BULLETIN, 1994, 73 (06): : 129 - &
  • [22] SILICON-NITRIDE
    AULT, NN
    HARTLINE, SD
    AMERICAN CERAMIC SOCIETY BULLETIN, 1989, 68 (05): : 1063 - 1064
  • [23] COMPARISON OF LASER AND PLASMA ASSISTED DEPOSITION OF SILICON-NITRIDE
    RITCHIE, WH
    METZ, W
    BOYER, PK
    COLLINS, GJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C78 - C78
  • [24] SILICON-NITRIDE
    AULT, NN
    YECKLEY, RL
    AMERICAN CERAMIC SOCIETY BULLETIN, 1992, 71 (05): : 816 - 816
  • [25] SILICON-NITRIDE
    AULT, NN
    YECKLEY, RL
    AMERICAN CERAMIC SOCIETY BULLETIN, 1995, 74 (06): : 153 - 155
  • [26] MECHANISTIC CONSIDERATIONS IN THE PLASMA DEPOSITION OF SILICON-NITRIDE FILMS
    CHIANG, JN
    HESS, DW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (07) : 2222 - 2226
  • [27] FACTORIAL DESIGN APPLIED TO PLASMA SILICON-NITRIDE DEPOSITION
    BLISH, RC
    SREDNI, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C373 - C373
  • [28] R F PLASMA DEPOSITION OF SILICON-NITRIDE LAYERS
    HELIX, MJ
    VAIDYANATHAN, KV
    STREETMAN, BG
    DIETRICH, HB
    CHATTERJEE, PK
    THIN SOLID FILMS, 1978, 55 (01) : 143 - 148
  • [29] SILICON-NITRIDE POWDERS - INVESTIGATING THE COSTS OF PRODUCTION
    SCHOENUNG, JM
    CIM BULLETIN, 1988, 81 (914): : 91 - 91
  • [30] PRODUCTION REACTOR FOR LOW-TEMPERATURE PLASMA-ENHANCED SILICON-NITRIDE DEPOSITION
    ROSLER, RS
    BENZING, WC
    BALDO, J
    SOLID STATE TECHNOLOGY, 1976, 19 (06) : 45 - 50