INHIBITION OF ELECTROMIGRATION DAMAGE IN THIN-FILMS

被引：76
|
作者：
ROSENBER.R
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 01期
关键词：
D O I：
10.1116/1.1316576
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：263 / &
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