A REGRESSION METHOD FOR DETERMINING EPITAXIAL FILM THICKNESS

被引:0
|
作者
GRIGOREV, VK
PETROVSKII, VI
FEDUNINA, TA
机构
来源
MEASUREMENT TECHNIQUES USSR | 1981年 / 24卷 / 12期
关键词
D O I
10.1007/BF00828708
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:1042 / 1045
页数:4
相关论文
共 50 条
  • [21] Mosaic structure in epitaxial GaN film varying with thickness
    Zhang Yun
    Xie Zi-Li
    Wang-Jian
    Tao Tao
    Zhang Rong
    Liu Bin
    Chen Peng
    Han Ping
    Shi Yi
    Zheng You-Dou
    ACTA PHYSICA SINICA, 2013, 62 (05)
  • [22] Thickness dependence of the epitaxial structure of vanadyl phthalocyanine film
    Hoshi, Hajime, 1600, JJAP, Minato-ku, Japan (33):
  • [23] PHOTOMETRIC-METHOD OF DETERMINING GOLD FILM THICKNESS OF NUCLEAR RADIATION SILICON DETECTORS
    NIKITIN, BA
    ZAKHARCHUK, DV
    KOVALEV, II
    NIKOLAEVA, TV
    SERUSHKINA, ES
    MEASUREMENT TECHNIQUES USSR, 1987, 30 (02): : 196 - 198
  • [24] An indentation method for determining the film thickness, Young's modulus, and hardness of bilayer materials
    Zhao, Siwei
    Zhang, Jianwei
    Li, Yuanxin
    Liu, Haitao
    Wang, Bingbing
    Zhao, Minghao
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2022, 55 (27)
  • [25] EXPRESS METHOD OF DETERMINING PLATING THICKNESS
    KOTIK, FI
    KOCHEREZ.EI
    INDUSTRIAL LABORATORY, 1968, 34 (02): : 243 - &
  • [26] METHOD FOR MEASURING THICKNESS OF EPITAXIAL SILICON FILMS
    DASH, WC
    JOURNAL OF APPLIED PHYSICS, 1962, 33 (07) : 2395 - &
  • [27] A sensitivity-improved amplitude method for determining film thickness based on the partial reflection waves
    Wang, Jianyun
    He, Yanbo
    Shu, Kun
    Zhang, Chuanwei
    Yu, Haide
    Gu, Le
    Wang, Tingjian
    Li, Zhen
    Wang, Liqin
    TRIBOLOGY INTERNATIONAL, 2023, 189
  • [29] An Indentation Method for Determining the Elastic Modulus, Hardness and Film Thickness of a Tri-Layer Materials
    Zhao, Siwei
    Li, Yuanxin
    Zhang, Jianwei
    Wang, Bingbing
    Zhao, Minghao
    Lu, Chunsheng
    INTERNATIONAL JOURNAL OF APPLIED MECHANICS, 2024, 16 (04)
  • [30] FAR-INFRARED INTERFERENCE TECHNIQUE FOR DETERMINING EPITAXIAL SILICON THICKNESS
    SAIFI, MA
    STOLEN, RH
    JOURNAL OF APPLIED PHYSICS, 1972, 43 (03) : 1171 - &