REACTIVE LASER ABLATION SYNTHESIS OF NANOSIZE ALUMINUM NITRIDE

被引:29
|
作者
JOHNSTON, GP
MUENCHAUSEN, RE
SMITH, DM
FOLTYN, SR
机构
[1] UNIV NEW MEXICO,NSF CTR MICROENGINEERED CERAM,ALBUQUERQUE,NM 87131
[2] LOS ALAMOS NATL LAB,CTR SUPERCONDUCT TECHNOL,LOS ALAMOS,NM 87545
关键词
D O I
10.1111/j.1151-2916.1992.tb04451.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
An aluminum (Al) target was laser ablated in a nitrogen (N2) atmosphere, producing aluminum nitride (AlN) powder. These powders were calcined at 900-degrees-C for 2 h. Powders were produced at various nitrogen pressures, and the calcined powders were tested for unreacted aluminum content, using differential thermal analysis (DTA). The AlN powder, produced at a laser fluence of 12 J/cm2 and a nitrogen pressure of 10.0 kPa (75 torr), showed no evidence of unreacted aluminum by DTA and was phase-pure AlN by X-ray diffraction (XRD). The surface area of this powder is 82 m2/g, corresponding to a particle size of approximately 11 nm, which is in good agreement with TEM observations.
引用
收藏
页码:3465 / 3468
页数:4
相关论文
共 50 条
  • [22] Enhancement of nitridation in synthesis of aluminum nitride nanosize powders by pulsed wire discharge
    Cho, C
    Kinemuchi, Y
    Suematsu, H
    Jiang, WH
    Yatsui, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (4A): : 1763 - 1765
  • [23] Synthesis of nanosize powders by pulsed laser ablation and related plasma diagnostics
    Yatsui, K
    Jiang, W
    Nishiura, K
    Yukawa, T
    Grigoriu, C
    Chis, I
    Marcu, A
    Miu, D
    FIFTH CONFERENCE ON OPTICS (ROMOPTO '97), PTS 1 AND 2, 1998, 3405 : 153 - 161
  • [24] Laser ablation synthesis and characterization of nitride coatings
    A. Kumar
    HI. Chan
    U. Ekanayake
    A. Wierzbicki
    N. B. Dahotre
    Journal of Materials Engineering and Performance, 1997, 6 : 577 - 582
  • [25] Laser ablation synthesis and characterization of nitride coatings
    Kumar, A
    Chan, HL
    Ekanayake, U
    Wierzbicki, A
    Dahotre, NB
    JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE, 1997, 6 (05) : 577 - 582
  • [26] Laser reactive ablation deposition of carbon nitride thin films
    Luches, A
    Caricato, AP
    Leggieri, G
    Martino, M
    Perrone, A
    Barucca, G
    Mengucci, P
    Zemek, J
    HIGH-POWER LASERS: APPLICATIONS AND EMERGING APPLICATIONS, 1996, 2789 : 293 - 304
  • [27] Yttrium nitride thin films grown by reactive laser ablation
    De La Cruz, W
    Díaz, JA
    Mancera, L
    Takeuchi, N
    Soto, G
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2003, 64 (11) : 2273 - 2279
  • [28] Beryllium nitride thin film grown by reactive laser ablation
    Soto, G
    Díaz, JA
    Machorro, R
    Reyes-Serrato, A
    de la Cruz, W
    MATERIALS LETTERS, 2002, 52 (1-2) : 29 - 33
  • [29] Excimer laser reactive ablation deposition of silicon nitride films
    D'Anna, E., 1600, Elsevier Science B.V., Amsterdam, Netherlands (86):
  • [30] Ablation of aluminum nitride films by nanosecond and femtosecond laser pulses
    Gruzdev, Vitaly
    Tzou, Robert
    Salakhutdinov, Ildar
    Danylyuk, Yuriy
    McCullen, Erik
    Auner, Gregory
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING VII, 2009, 7201