THERMAL-STABILITY OF HYDROGEN IN SILICON-NITRIDE FILMS PREPARED BY ECR PLASMA CVD METHOD

被引：17
|
作者：
HIRAO, T [1 ]
KAMADA, T [1 ]
KITAGAWA, M [1 ]
SETSUNE, K [1 ]
WASA, K [1 ]
MATSUDA, A [1 ]
TANAKA, K [1 ]
机构：
[1] ELECTROTECH LAB,SAKURA,IBARAKI 305,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 04期
关键词：
D O I：
10.1143/JJAP.27.528
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：528 / 533
页数：6
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