HALL AND ELECTROREFLECTANCE STUDIES OF THE EFFECTS OF DOPING IN MERCURY-CADMIUM TELLURIDE GROWN BY MOLECULAR-BEAM EPITAXY

被引：13
|
作者：
RACCAH, PM
GARLAND, JW
ZHANG, Z
CHU, AHM
RENO, J
SOU, IK
BOUKERCHE, M
FAURIE, JP
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 04期
关键词：
D O I：
10.1116/1.574030
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2077 / 2080
页数：4
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