共 50 条
- [31] Chemical-mechanical polishing of copper with model slurries ELECTROCHEMICAL SCIENCE AND TECHNOLOGY OF COPPER, PROCEEDINGS, 2002, 2000 (30): : 103 - 116
- [32] Chemical-mechanical polishing: Enhancing the manufacturability of MEMS MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY II, 1996, 2879 : 104 - 115
- [34] Modeling of chemical-mechanical polishing with soft pads APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1998, 67 (02): : 249 - 252
- [36] Tribological behavior of copper chemical-mechanical polishing SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS, 2001, : 851 - 854
- [37] The characteristic of abrasive particle in chemical-mechanical polishing PROGRESS ON ADVANCED MANUFACTURE FOR MICRO/NANO TECHNOLOGY 2005, PT 1 AND 2, 2006, 505-507 : 805 - 810
- [39] Chemical-Mechanical Polishing of Bulk Tungsten Substrate 2013 14TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY (ICEPT), 2013, : 676 - 678