Chemical-mechanical polishing: Enhancing the manufacturability of MEMS

被引：24
|
作者：
Sniegowski, JJ [1 ]
机构：
[1] SANDIA NATL LABS,INTELLIGENT MICROMACHINES DEPT,ALBUQUERQUE,NM 87185
来源：
MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY II | 1996年 / 2879卷
关键词：
surface micromachining; polysilicon; microelectromechanical systems; chemical mechanical polishing; planarization;
D O I：
10.1117/12.251237
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：104 / 115
页数：12
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