HETEROEPITAXIAL GROWTH OF LITAO3 SINGLE-CRYSTAL FILMS BY RF MAGNETRON SPUTTERING

被引：31

作者：

SAITO, Y ^{[1
]}

SHIOSAKI, T ^{[1
]}

机构：

[1] KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 9B期

关键词：

LITAO3; RF MAGNETRON SPUTTERING; X-RAY DIFFRACTION; RHEED; SEM; TRANSMISSION SPECTRUM;

D O I：

10.1143/JJAP.30.2204

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Lithium tantalate (LiTaO3) thin films were deposited on sapphire-C substrates by rf magnetron sputtering at various substrate temperatures. The crystallinity was examined by X-ray diffraction and reflection high-energy electron diffraction (RHEED), and the refractive indices were determined by the prism coupling m-lines technique and the interferometric transmission spectrum. Single-crystal (0001)LiTaO3 films were heteroepitaxially grown on sapphire-C substrates above 600-degrees-C, and the dispersion relation of the refractive index agreed well with that of the bulk single crystal.

引用

页码：2204 / 2207

页数：4

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