HETEROEPITAXIAL GROWTH OF LITAO3 SINGLE-CRYSTAL FILMS BY RF MAGNETRON SPUTTERING

被引：31
|
作者：
SAITO, Y [1 ]
SHIOSAKI, T [1 ]
机构：
[1] KYOTO UNIV,FAC ENGN,DEPT ELECTR,KYOTO 606,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 9B期
关键词：
LITAO3; RF MAGNETRON SPUTTERING; X-RAY DIFFRACTION; RHEED; SEM; TRANSMISSION SPECTRUM;
D O I：
10.1143/JJAP.30.2204
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Lithium tantalate (LiTaO3) thin films were deposited on sapphire-C substrates by rf magnetron sputtering at various substrate temperatures. The crystallinity was examined by X-ray diffraction and reflection high-energy electron diffraction (RHEED), and the refractive indices were determined by the prism coupling m-lines technique and the interferometric transmission spectrum. Single-crystal (0001)LiTaO3 films were heteroepitaxially grown on sapphire-C substrates above 600-degrees-C, and the dispersion relation of the refractive index agreed well with that of the bulk single crystal.
引用
收藏
页码：2204 / 2207
页数：4
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