PHOTORESIST TECHNOLOGY AND PROCESSING TECHNIQUES FOR FINE DIMENSIONAL CONTROL

被引:0
|
作者
CLARK, KG
机构
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:73 / 79
页数:7
相关论文
共 50 条
  • [1] Control and signal processing for photoresist processing in microlithography
    Tay, A
    Ho, WK
    Lim, KW
    Loh, AP
    Tan, WW
    [J]. IECON-2002: PROCEEDINGS OF THE 2002 28TH ANNUAL CONFERENCE OF THE IEEE INDUSTRIAL ELECTRONICS SOCIETY, VOLS 1-4, 2002, : 1468 - 1473
  • [2] Monitoring and control of photoresist properties and CD during photoresist processing
    Yang, Geng
    Ngo, Yit-Sung
    Putra, Andi S.
    Ang, Kar-Tien
    Tay, Arthur
    Fang, Zhong-Ping
    [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXIV, 2010, 7638
  • [3] Advanced photoresist dispense valve control technology
    Standley, Garrett
    Kidd, Brian
    Hartman, Kevin
    [J]. ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2, 2006, 6153 : U1722 - U1732
  • [4] Control of spatial and transient temperature trajectories for photoresist processing
    El-Awady, K
    Schaper, CD
    Kailath, T
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (05): : 2109 - 2114
  • [5] 3-DIMENSIONAL SIMULATIONS OF HIGH-RESOLUTION PHOTORESIST PROCESSING
    BAROUCH, E
    BRADIE, B
    FOWLER, HA
    [J]. JOURNAL OF IMAGING SCIENCE, 1991, 35 (04): : 240 - 251
  • [6] CYTOLOGIC PROCESSING TECHNIQUES FOR FINE NEEDLE ASPIRATIONS
    VILLARREAL, YM
    CURRENS, HS
    [J]. ACTA CYTOLOGICA, 1981, 25 (06) : 710 - 711
  • [7] Modeling and Real-Time Control of Multizone Thermal Processing System for Photoresist Processing
    Tay, Arthur
    Chua, Hui Tong
    Wang Yuheng
    Yang Geng
    Khuen, Ho Weng
    [J]. INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 2013, 52 (13) : 4805 - 4814
  • [8] Control of Semiconductor Substrate Temperature Uniformity during Photoresist Processing in Lithography
    Tay, Arthur
    Chua, Hui-Tong
    Wang, Yuheng
    Yang, Geng
    [J]. ASCC: 2009 7TH ASIAN CONTROL CONFERENCE, VOLS 1-3, 2009, : 853 - 858
  • [9] Laminated photoresist layer technology and residual stress control for micromirror fabrication
    Li, Jia-Dong
    Zhang, Ping
    Wu, Yi-Hui
    Xuan, Ming
    Liu, Yong-Shun
    Wang, Shu-Rong
    [J]. Guangxue Jingmi Gongcheng/Optics and Precision Engineering, 2008, 16 (11): : 2204 - 2208
  • [10] REVIEW OF OIL AGGLOMERATION TECHNIQUES FOR PROCESSING OF FINE COALS
    MEHROTRA, VP
    SASTRY, KVS
    MOREY, BW
    [J]. INTERNATIONAL JOURNAL OF MINERAL PROCESSING, 1983, 11 (03) : 175 - 201