3-DIMENSIONAL SIMULATIONS OF HIGH-RESOLUTION PHOTORESIST PROCESSING

被引：0
|
作者：
BAROUCH, E
BRADIE, B
FOWLER, HA
机构：
[1] CLARKSON UNIV,DEPT MATH & COMP SCI,POTSDAM,NY 13676
[2] NATL INST STAND & TECHNOL,COMP & APPL MATH LAB,GAITHERSBURG,MD 20899
来源：
JOURNAL OF IMAGING SCIENCE | 1991年 / 35卷 / 04期
关键词：
D O I：
暂无
中图分类号：
TB8 [摄影技术];
学科分类号：
0804 ;
摘要：
A computer simulation package for optical microlithography contains modules for the processing of positive photoresists in the three stages of aerial-image transfer, exposure-bleaching, and dissolution. Evolving and final resist profiles are displayed in three dimensions at several dissolution times, thus simulating real systems in their natural form. Results presented for a variety of examples demonstrate the robustness and versatility of the package.
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页码：240 / 251
页数：12
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