NOVEL F2 DETECTOR FOR THE GAS MONITOR OF AN EXCIMER LASER

被引:0
|
作者
HAKUTA, K
MUKAI, N
MIKI, S
TAKUMA, H
机构
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 1986年 / 57卷 / 10期
关键词
D O I
10.1063/1.1139104
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:2529 / 2531
页数:3
相关论文
共 50 条
  • [31] F2 laser ablation of silicone rubber
    Takao, H
    Okoshi, M
    Inoue, N
    FIFTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2004, 5662 : 238 - 242
  • [32] Photoproduction of the f2(1270) Meson Using the CLAS Detector
    Carver, M.
    Celentano, A.
    Hicks, K.
    Marsicano, L.
    Mathieu, V
    Pilloni, A.
    Adhikari, K. P.
    Adhikari, S.
    Amaryan, M. J.
    Angelini, G.
    Atac, H.
    Baltzell, N. A.
    Barion, L.
    Battaglieri, M.
    Bedlinskiy, I
    Benmokhtar, F.
    Bianconi, A.
    Biselli, A. S.
    Bondi, M.
    Bossu, F.
    Boiarinov, S.
    Briscoe, W. J.
    Brooks, W. K.
    Bulumulla, D.
    Burkert, V. D.
    Carman, D. S.
    Carvajal, J. C.
    Chatagnon, P.
    Chetry, T.
    Ciullo, G.
    Clark, L.
    Clary, B. A.
    Cole, P. L.
    Contalbrigo, M.
    Crede, V
    D'Angelo, A.
    Dashyan, N.
    De Vita, R.
    Defurne, M.
    Deur, A.
    Diehl, S.
    Djalali, C.
    Dugger, M.
    Dupre, R.
    Egiyan, H.
    Ehrhart, M.
    El Alaoui, A.
    El Fassi, L.
    Eugenio, P.
    Fedotov, G.
    PHYSICAL REVIEW LETTERS, 2021, 126 (08)
  • [33] Fabry-Perot type antireflective coatings for binary mask applications in ArF and F2 excimer laser lithographies
    Chen, HL
    Lee, CC
    Chuang, YF
    Liu, MC
    Hsieh, CI
    Ko, FH
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2003, 6 (04) : G59 - G61
  • [34] Development of high-reflection mirrors of fluoride multilayers for F2 excimer laser by ion beam sputtering method
    Yoshida, T
    Nishimoto, K
    Etoh, K
    Kataoka, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (09): : 5751 - 5752
  • [35] Development of high-reflection mirrors of fluoride multilayers for F2 excimer laser by ion beam sputtering method
    Yoshida, Toshiya
    Nishimoto, Keiji
    Etoh, Kazuyuki
    Kataoka, Izumi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (09): : 5751 - 5752
  • [36] The pump intensity effect on the efficiency of discharge-pumped ArF excimer laser on a mixture of He:Ar:F2
    Razhev, Alexander M.
    Zhupikov, Andrey A.
    Atomic and Molecular Pulsed Lasers VI, 2005, 6263 : 26306 - 26306
  • [37] Extending the performance of KrF laser for microlithography by using novel F2 control technology
    Zambon, P
    Gong, MX
    Carlesi, J
    Padmabandu, GG
    Binder, M
    Swanson, K
    Das, P
    OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2, 2000, 4000 : 1461 - 1470
  • [38] Longitudinally excited F2 laser and gain measurement at a total gas pressure of 40 Torr
    El-Osealy, MAM
    Ido, T
    Nakamura, K
    Jitsuno, J
    Goto, T
    INTERNATIONAL CONFERENCE ON ATOMIC AND MOLECULAR PULSED LASERS IV, 2002, 4747 : 117 - 121
  • [39] CIF AND F2 - 2 NEW UV LASER SYSTEMS
    HOHLA, K
    DIEGELMANN, M
    PUMMER, H
    KOMPA, KL
    OPTICS AND LASER TECHNOLOGY, 1979, 11 (06): : 305 - 310
  • [40] VUV EMISSIONS FROM MIXTURES OF F2 AND NOBLE-GASES - MOLECULAR F2 LASER AT 1575 A
    RICE, JK
    HAYS, AK
    WOODWORTH, JR
    APPLIED PHYSICS LETTERS, 1977, 31 (01) : 31 - 33