NOVEL F2 DETECTOR FOR THE GAS MONITOR OF AN EXCIMER LASER

被引:0
|
作者
HAKUTA, K
MUKAI, N
MIKI, S
TAKUMA, H
机构
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 1986年 / 57卷 / 10期
关键词
D O I
10.1063/1.1139104
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:2529 / 2531
页数:3
相关论文
共 50 条
  • [21] Excimer ArF laser with an output energy of 1.3 J at 2.0% efficiency on the He:Ar:F2 mixture
    A.M. Razhev
    A.A. Zhupikov
    Applied Physics B, 2005, 81 : 1113 - 1117
  • [22] Peculiarities of photoluminescence excited by 157 nm wavelength F2 excimer laser in fused and unfused silicon dioxide
    Trukhin, A. N.
    Golant, K. M.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2009, 355 (34-36) : 1719 - 1725
  • [23] F2 excimer laser (157 nm) ablation of polymers:: relation of neutral and ionic fragment detection and absorption
    Kuhnke, M.
    Cramer, L.
    Dyer, P. E.
    Dickinson, J. T.
    Lippert, T.
    Niino, H.
    Pervolaraki, M.
    Walton, C. D.
    Wokaun, A.
    COLA'05: 8TH INTERNATIONAL CONFERENCE ON LASER ABLATION, 2007, 59 : 625 - +
  • [24] Adhesion mechanism of micro bubbles on ArF and F2 excimer resists
    Endo, H
    Kawai, A
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2004, 17 (05) : 713 - 714
  • [25] Influence of laser fluence and irradiation timing of F2 laser on ablation properties of fused silica in F2-KrF excimer laser multi-wavelength excitation process
    Obata, K
    Sugioka, K
    Akane, T
    Aoki, N
    Toyoda, K
    Midorikawa, K
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2001, 73 (06): : 755 - 759
  • [26] Influence of laser fluence and irradiation timing of F2 laser on ablation properties of fused silica in F2-KrF excimer laser multi-wavelength excitation process
    K. Obata
    K. Sugioka
    T. Akane
    N. Aoki
    K. Toyoda
    K. Midorikawa
    Applied Physics A, 2001, 73 : 755 - 759
  • [27] F2 REACTIONS AS POSSIBLE LASER CANDIDATES
    DAVIS, SJ
    HAGER, G
    HADLEY, SG
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1975, 11 (08) : 693 - 693
  • [28] F2 laser resist with fluorinated polymers
    Naito, T
    Saito, S
    Shida, N
    Ushirogouchi, T
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (04) : 689 - 692
  • [29] Revisiting F2 laser for DUV microlithography
    Hofmann, T
    Hueber, JM
    Das, P
    Scholler, S
    OPTICAL MICROLITHOGRAPHY XII, PTS 1 AND 2, 1999, 3679 : 541 - 546
  • [30] Interaction of F2 excimer laser with SiO2 glasses:: Towards the third generation of synthetic SiO2 glasses
    Hosono, H
    Ikuta, Y
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 166 : 691 - 697