REACTION-KINETICS OF TUNGSTEN THIN-FILMS ON SILICON (100) SURFACES

被引：90
|
作者：
LOCKER, LD [1 ]
CAPIO, CD [1 ]
机构：
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
来源：
JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 10期
关键词：
D O I：
10.1063/1.1661965
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4366 / 4369
页数：4
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