REACTION-KINETICS OF TUNGSTEN THIN-FILMS ON SILICON (100) SURFACES

被引：90

|

作者：

LOCKER, LD ^{[1
]}

CAPIO, CD ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 10期

关键词：

D O I：

10.1063/1.1661965

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：4366 / 4369

页数：4

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