REACTION OF MO THIN-FILMS ON SI (100) SURFACES

被引：50
|
作者：
YANAGISAWA, S
FUKUYAMA, T
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 05期
关键词：
D O I：
10.1149/1.2129837
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1150 / 1156
页数：7
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