共 50 条
- [1] MOLECULAR-WEIGHT DEPENDENCE OF ELECTRON-BEAM RESIST SENSITIVITY ACS SYMPOSIUM SERIES, 1990, 417 : 516 - 533
- [2] E-beam resist outgassing for study of correlation between resist sensitivity and e-beam optic contamination PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XX, 2013, 8701
- [3] Exposure of molecular glass resist by e-beam and EUVIL ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
- [4] POLY(ARYLINE IMIDES) AS E-BEAM RESIST - SENSITIVITY AND RESOLUTION POLYMER ENGINEERING AND SCIENCE, 1989, 29 (14): : 937 - 941
- [6] EFFECTS OF MOLECULAR-WEIGHT ON SENSITIVITY OF POLYMERIC ELECTRON RESIST SYSTEMS ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1975, 170 (AUG24): : 42 - 42
- [8] Analysis of e-beam impact on the resist stack in e-beam lithography process ELECTRON TECHNOLOGY CONFERENCE 2013, 2013, 8902
- [9] RESOLUTION AND SENSITIVITY DEPENDENCE ON THE MOLECULAR-WEIGHT DISTRIBUTION OF A PHOTORESIST JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1980 - 1983