RELATIONSHIP OF Nb SURFACE MORPHOLOGY AND Al COVERAGE TO THE INTRINSIC STRESS OF MAGNETRON -SPUTTERED Nb FILMS

被引：15

作者：

Tsukada, K. ^{[1
]}

Kawai, J. ^{[1
]}

Uehara, G. ^{[1
]}

Kado, H. ^{[1
]}

机构：

[1] Superconducting Sensor Lab, 2-1200 Muzaigakuendai, Chiba 27013, Japan

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1993年 / 3卷 / 01期

关键词：

D O I：

10.1109/77.234018

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

To optimize Nb/Al-AlOx/Nb Josephson junctions, atomic force microscopy is used to study the morphology of dc magnetron-sputtered Nb and Al. When the intrinsic stress of Nb films is varied by adjusting Ar pressure, the roughness of Nb films is correlated with the intrinsic stress. Stress-free Nb films have a smooth surface, without depressions, and a roughness of 14.6 angstrom. The roughness of Al deposited on the Nb films reflects the roughness of the underlying Nb, and an Al thickness of more than 40 angstrom is needed to cover the Nb surface without interruption.

引用

页码：2944 / 2946

页数：3

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