ODMR INVESTIGATIONS OF DX CENTERS IN SN-DOPED AND SI-DOPED ALXGA1-XAS

被引:4
|
作者
FOCKELE, M
SPAETH, JM
OVERHOF, H
GIBART, P
机构
[1] Fachbereich Phys., Paderborn Univ.
关键词
D O I
10.1088/0268-1242/6/10B/017
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In a thick (100-mu-m) Sn-doped Al0.35Ga0.65As layer and an 11-mu-m Si-doped Al0.41Ga0.59As layer the magnetic circular dichroism (MCDA) of the optical absorption, the optically detected electron spin resonance (ODEPR) and the photoconductivity (only in the Sn layer) have been measured simultaneously. All signals appear together after the photoionization of the DX centre and are directly correlated to each other. The ODEPR spectra measured in the MCDA bands show the hyperfine doublets due to the magnetic Sn-117 and Sn-119 isotopes (l = 1/2) in Sn-doped samples and an ODEPR line (l = 0) in Si-doped layers. The 4.7% abundant Si-29 (l = 1/2) isotopes could not be observed. We show that the MCDA is due to a neutral (Si0,Sn0) donor, a deep level which is stable at 1.6 K in the dark. This DX0 state needs thermal energy or light to capture an electron to form the negative-U DX- ground state which contains one donor dopant in a large lattice configuration.
引用
收藏
页码:B88 / B91
页数:4
相关论文
共 50 条
  • [21] LATTICE STRAIN FROM DX CENTERS AND PERSISTENT PHOTOCARRIERS IN SN-DOPED AND SI-DOPED GA1-XALXAS
    CARGILL, GS
    SEGMULLER, A
    KUECH, TF
    THEIS, TN
    PHYSICAL REVIEW B, 1992, 46 (16): : 10078 - 10085
  • [22] NEW BISTABLE DEFECT WITH DEEP LEVELS IN SI-DOPED ALXGA1-XAS
    SOBOLEV, MM
    KOCHNEV, IV
    PAPENTSEV, MI
    SEMICONDUCTORS, 1994, 28 (04) : 397 - 400
  • [23] TRANSIENT AND STEADY DECAY OF PERSISTENT PHOTOCONDUCTIVITY IN SI-DOPED ALXGA1-XAS
    SAMPAIO, JF
    CHAVES, AS
    RIBEIRO, GM
    GUIMARAES, PSS
    DECARVALHO, RP
    DEOLIVEIRA, AG
    PHYSICAL REVIEW B, 1991, 44 (19): : 10933 - 10936
  • [24] PROPERTIES OF DX CENTERS IN ALXGA1-XAS CO-DOPED WITH BORON AND SILICON
    MOONEY, PM
    TISCHLER, MA
    PARKER, BD
    APPLIED PHYSICS LETTERS, 1991, 59 (22) : 2829 - 2831
  • [25] Detailed electrical characterization of DX centers in Se-doped AlxGa1-xAs
    Duenas, S
    Pinacho, R
    Castan, E
    Quintanilla, L
    Pelaez, R
    Barbolla, J
    JOURNAL OF APPLIED PHYSICS, 1997, 82 (09) : 4338 - 4345
  • [26] PRESSURE AND PERSISTENT PHOTOCONDUCTIVITY STUDIES OF DX CENTERS IN SI-SIGMA DOPED ALXGA1-XAS LAYERS
    LAVIELLE, D
    RANZ, E
    PORTAL, JC
    BARBIER, E
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1990, (106): : 297 - 302
  • [27] PRESSURE-DEPENDENCE AND COMPARISON OF THE SI AND SN RELATED DX CENTERS IN ALXGA1-XAS
    LAVIELLE, D
    SALLESE, JM
    GOUTIERS, B
    DMOWSKI, L
    BASMAJI, P
    PORTAL, JC
    GIBART, P
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1990, (106): : 315 - 320
  • [28] MICROSCOPIC STRUCTURE OF THE DX CENTER IN SI-DOPED ALXGA1-XAS - OBSERVATION OF A VACANCY BY POSITRON-ANNIHILATION SPECTROSCOPY
    MAKINEN, J
    LAINE, T
    SAARINEN, K
    HAUTOJARVI, P
    CORBEL, C
    AIRAKSINEN, VM
    NAGLE, J
    PHYSICAL REVIEW B, 1995, 52 (07): : 4870 - 4883
  • [29] On the electron capture kinetics of DX centers in AlxGa1-xAs:Si
    Stoger, G.
    Brunthaler, G.
    Ostermayer, G.
    Jantsch, W.
    Wilamowski, Z.
    Kohler, K.
    Materials Science Forum, 1994, 143-4 (pt 2) : 1149 - 1154
  • [30] ELECTRICAL-PROPERTIES OF SI-DOPED ALXGA1-XAS LAYERS GROWN BY MBE
    ISHIKAWA, T
    SAITO, J
    SASA, S
    HIYAMIZU, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (11): : L675 - L676