TEMPERATURE-MEASUREMENT DURING REACTIVE ION ETCHING

被引：0

作者：

SCHAIBLE, PM ^{[1
]}

SCHWARTZ, GC ^{[1
]}

机构：

[1] IBM CORP,E FISHKILL FACIL,DIV DATA SYST,HOPEWELL JUNCTION,NY 12533

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中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

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页码：C90 / C90

页数：1

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