INTRODUCTION OF HYDROGEN IN SIO2-FILMS BY EXPOSURE TO A HYDROGEN PLASMA

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|

作者：

STEIN, HJ ^{[1
]}

PEERCY, PS ^{[1
]}

机构：

[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 08期

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D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：C328 / C328

页数：1

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