N-TYPE DOPING OF GALLIUM ANTIMONIDE AND ALUMINUM ANTIMONIDE GROWN BY MOLECULAR-BEAM EPITAXY, USING LEAD-TELLURIDE AS A DOPANT SOURCE

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作者
SUBBANNA, S [1 ]
TUTTLE, G [1 ]
KROEMER, H [1 ]
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[1] UNIV CALIF SANTA BARBARA,DEPT ELECT & COMP ENGN,SANTA BARBARA,CA 93106
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:A17 / A17
页数:1
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