X-RAY-PRODUCTION - 13 NM FROM LASER-PRODUCED PLASMAS FOR PROJECTION X-RAY-LITHOGRAPHY APPLICATIONS

被引：50
|
作者：
KAUFFMAN, RL
PHILLION, DW
SPITZER, RC
机构：
[1] Lawrence Livermore National Laboratory, Livermore, CA, 94550
来源：
APPLIED OPTICS | 1993年 / 32卷 / 34期
关键词：
D O I：
10.1364/AO.32.006897
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
X-ray production in the region approximately 13 nm from laser-produced plasmas has been investigated as a source for projection x-ray lithography. The dependence of x-ray conversion efficiency on target material, intensity, and pulse length has been studied by using a 0.53-mum laser with a maximum of 0.3 J. A conversion efficiency of 1% into a 0.3-nm bandwidth has been demonstrated for Sn targets at intensities of approximately 10(11) W/cm2 by using a 7.5-ns pulse. Intensity scaling suggests that laser spot size and two-dimensional expansion are important for optimizing x-ray production at these low-irradiation intensities.
引用
收藏
页码：6897 / 6900
页数：4
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