共 50 条
ELLIPSOMETRIC RESPONSE TO HYDROGEN ADSORPTION ON THIN IRON FILMS
被引:1
|作者:
SCHMIDT, R
[1
]
WEDLER, G
[1
]
WISSMANN, P
[1
]
机构:
[1] UNIV ERLANGEN NURNBERG,INST PHYS & THEORET CHEM,W-8520 ERLANGEN,GERMANY
来源:
关键词:
D O I:
10.1016/0042-207X(90)94026-M
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
We report on measurements of the dielectric function of thin iron films deposited on glass substrates under uhv conditions and subsequently covered with hydrogen at 77 K as well as the 293 K. Hydrogen adsorption at 77 K causes the ellipsometrical parameters delta-DELTA and delta-psi to increase by 0.1-degrees and 0.03-degrees, respectively. At 293 K the delta-psi values slightly decrease (lambda = 1152 nm). The results are discussed on the basis of a three-layer model based on the extrapolated macroscopic theory.
引用
收藏
页码:1590 / 1592
页数:3
相关论文