ELLIPSOMETRIC RESPONSE TO HYDROGEN ADSORPTION ON THIN IRON FILMS

被引：1
|
作者：
SCHMIDT, R [1 ]
WEDLER, G [1 ]
WISSMANN, P [1 ]
机构：
[1] UNIV ERLANGEN NURNBERG,INST PHYS & THEORET CHEM,W-8520 ERLANGEN,GERMANY
来源：
VACUUM | 1990年 / 41卷 / 7-9期
关键词：
D O I：
10.1016/0042-207X(90)94026-M
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We report on measurements of the dielectric function of thin iron films deposited on glass substrates under uhv conditions and subsequently covered with hydrogen at 77 K as well as the 293 K. Hydrogen adsorption at 77 K causes the ellipsometrical parameters delta-DELTA and delta-psi to increase by 0.1-degrees and 0.03-degrees, respectively. At 293 K the delta-psi values slightly decrease (lambda = 1152 nm). The results are discussed on the basis of a three-layer model based on the extrapolated macroscopic theory.
引用
收藏
页码：1590 / 1592
页数：3
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