GROWTH OF LARGE DIAMETER SILICON AND GERMANIUM CRYSTALS BY THE TEAL-LITTLE METHOD

被引：3
|
作者：
RUNYAN, WR
机构：
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1959年 / 30卷 / 07期
关键词：
D O I：
10.1063/1.1716676
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：535 / 540
页数：6
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