A HIGH-SPEED ELECTRON-BEAM LITHOGRAPHY SYSTEM

被引：15

作者：

EIDSON, JC

SCUDDER, RK

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571193

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：932 / 935

页数：4

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