A HIGH-SPEED ELECTRON-BEAM LITHOGRAPHY SYSTEM

被引：15
|
作者：
EIDSON, JC
SCUDDER, RK
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
关键词：
D O I：
10.1116/1.571193
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：932 / 935
页数：4
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