CURRENT APPLICATIONS OF LOW-PRESSURE RF PLASMA TO THIN AND THICK-FILM TECHNOLOGIES

被引：0
|
作者：
JACOB, A [1 ]
机构：
[1] LFE CORP,PROC CONTROL DIV,EXCITED GAS R&D LAB,WALTHAM,MA 02145
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 01期
关键词：
D O I：
10.1116/1.1317961
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：264 / &
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