PERFORMANCE AND MODELING OF A PERMANENT-MAGNET ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE

被引：11
|
作者：
SAPROO, A
MANTEI, TD
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1995年 / 13卷 / 03期
关键词：
D O I：
10.1116/1.579846
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：883 / 886
页数：4
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