EXCIMER LASER PLANARIZATION OF PATTERNED METAL FEATURES

被引：4
|
作者：
BASEMAN, RJ
ANDRESHAK, JC
SCHNITZEL, RH
CRONIN, JE
机构：
[1] IBM CORP,DIV GEN TECHNOL,HOPEWELL JUNCTION,NY 12533
[2] IBM CORP,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 05期
关键词：
D O I：
10.1116/1.584935
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1158 / 1160
页数：3
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