EXELFS ANALYSIS OF AMORPHOUS AND CRYSTALLINE SILICON-CARBIDE

被引:6
|
作者
MARTIN, JM [1 ]
MANSOT, JL [1 ]
机构
[1] INST PHYS & CHIM MAT,F-44072 NANTES,FRANCE
来源
关键词
SILICON CARBIDE; ELECTRON ENERGY LOSS; CRYSTALLOGRAPHY;
D O I
10.1111/j.1365-2818.1991.tb03127.x
中图分类号
TH742 [显微镜];
学科分类号
摘要
Core-shell ionization edges from thin specimens of cubic silicon carbide (c-SiC) are studied by means of electron energy-loss spectroscopy (EELS) in a transmission electron microscope (TEM). Special attention is paid to the investigation of extended energy-loss fine structures (EXELFS) to study local order effects around silicon atoms as a function of disorder in SiC. Two forms of SiC were used: c-SiC for the crystalline form, and friction-induced amorphous silicon carbide (a-SiC) for the disordered form. EXELFS are generated by the elastic backscattering of outgoing electron waves by neighbouring atoms. Results show that both Si-K and Si-L edges contain structural information. EXELFS at the Si-K edge can be used to calculate the radial distribution function (RDF) in the same way as extended X-ray absorption fine structures (EXAFS). EXELFS at the Si-L edge can be isolated by digital filtering. The high signal-to-noise ratio at the Si-L edge permits the effect of larger interatomic distances to be observed, and thus the EXELFS technique is of promise for studying the effect of disorder in Si-based ceramic materials with a high spatial resolution (nanometre scale).
引用
收藏
页码:171 / 178
页数:8
相关论文
共 50 条
  • [41] SOLDERING OF SILICON-CARBIDE
    SHIBALOV, MV
    WELDING PRODUCTION, 1974, 21 (01): : 56 - 58
  • [42] JOINING OF SILICON-CARBIDE
    MOROZUMI, S
    JOURNAL OF NUCLEAR MATERIALS, 1989, 169 : 270 - 272
  • [43] EROSION OF SILICON-CARBIDE
    ROUTBORT, JL
    SCATTERGOOD, RO
    TURNER, APL
    JOURNAL OF METALS, 1979, 31 (08): : F8 - F8
  • [44] CATHODOLUMINESCENCE OF SILICON-CARBIDE
    SODOMKA, L
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1978, 28 (02) : 233 - 236
  • [45] DINISTOR ON SILICON-CARBIDE
    VAINSHTEIN, SN
    DMITRIEV, VA
    SYRKIN, AL
    CHELNOKOV, VE
    PISMA V ZHURNAL TEKHNICHESKOI FIZIKI, 1987, 13 (16): : 991 - 993
  • [46] OXIDATION OF SILICON-CARBIDE
    KEYS, LH
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (08) : C253 - C253
  • [47] NOISE-ANALYSIS OF SILICON-CARBIDE JFETS
    FLATRESSE, P
    OUISSE, T
    SOLID-STATE ELECTRONICS, 1995, 38 (05) : 971 - 975
  • [48] DEUTERON CHANNELING FOR DEFECT ANALYSIS OF SILICON-CARBIDE
    NASHIYAMA, I
    NISHIJIMA, T
    SAKUMA, E
    YOSHIDA, S
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1988, 33 (1-4): : 599 - 602
  • [49] A NEW APPROACH TO THE ANALYSIS OF SILICON-CARBIDE REFRACTORIES
    JULIETTI, RJ
    REEVE, BCE
    BRITISH CERAMIC TRANSACTIONS AND JOURNAL, 1991, 90 (03): : 85 - 89
  • [50] Kapitza Resistance for Nanoscale Crystalline and Amorphous Silicon Carbide
    Xiao, Chengdi
    He, Hu
    Li, Junhui
    Zhu, Wenhui
    2018 19TH INTERNATIONAL CONFERENCE ON THERMAL, MECHANICAL AND MULTI-PHYSICS SIMULATION AND EXPERIMENTS IN MICROELECTRONICS AND MICROSYSTEMS (EUROSIME), 2018,