DESIGN OF AN EXPERIMENTAL REACTOR FOR INTRINSIC KINETICS OF CHEMICAL VAPOR-DEPOSITION

被引：1
|
作者：
LEE, HH
机构：
[1] Univ of Florida, Gainesville, FL,, USA, Univ of Florida, Gainesville, FL, USA
来源：
JOURNAL OF CRYSTAL GROWTH | 1988年 / 91卷 / 1-2期
关键词：
CHEMICAL REACTIONS - Reaction Kinetics - FILMS - Chemical Vapor Deposition;
D O I：
10.1016/0022-0248(88)90391-0
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
Despite the importance of intrinsic kinetics in chemical vapor deposition, no satisfactory experimental reactor or method has been devised for the determination of intrinsic kinetics. Presented is the design of such a reactor and its use for the determination of intrinsic kinetics. The design involves satisfying five conditions. Any rectangular, horizontal reactor designed so as to satisfy the conditions can be used for intrinsic kinetics. Use of the experimental reactor for uniform deposition is discussed.
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页码：234 / 238
页数：5
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