MORPHOLOGY AND STRUCTURE OF THERMALLY INDUCED MICRODEFECTS IN HIGH-TEMPERATURE TREATED CZOCHRALSKI-SILICON

被引：0
|
作者：
REICHE, M [1 ]
NITZSCHE, W [1 ]
机构：
[1] VEB MIKROELEKTR KARL MARX,DDR-5010 ERFURT,GER DEM REP
来源：
CRYSTAL RESEARCH AND TECHNOLOGY | 1986年 / 21卷 / 04期
关键词：
D O I：
10.1002/crat.2170210405
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
引用
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页码：461 / 467
页数：7
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