ENHANCEMENT OF THE KINETICS OF THERMAL-OXIDATION OF SILICON USING 1,1,1-TRICHLOROETHANE

被引：1

作者：

FLEMISH, JR ^{[1
]}

TRESSLER, RE ^{[1
]}

MONKOWSKI, JR ^{[1
]}

机构：

[1] MONKOWSKI RHINE INC,SAN DIEGO,CA 92126

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 05期

关键词：

D O I：

10.1149/1.2095920

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1192 / 1194

页数：3

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