ENHANCEMENT OF THE KINETICS OF THERMAL-OXIDATION OF SILICON USING 1,1,1-TRICHLOROETHANE

被引：1
|
作者：
FLEMISH, JR [1 ]
TRESSLER, RE [1 ]
MONKOWSKI, JR [1 ]
机构：
[1] MONKOWSKI RHINE INC,SAN DIEGO,CA 92126
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 05期
关键词：
D O I：
10.1149/1.2095920
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1192 / 1194
页数：3
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