ION-IMPLANTATION INTO INP FOR OPTOELECTRONIC DEVICES

被引：0
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作者：
HAUSSLER, W
ROMER, D
PLIHAL, M
机构：
来源：
SIEMENS FORSCHUNGS-UND ENTWICKLUNGSBERICHTE-SIEMENS RESEARCH AND DEVELOPMENT REPORTS | 1988年 / 17卷 / 04期
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
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页码：177 / 183
页数：7
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