STUDY OF PHOTOINDUCED EFFECT IN OBLIQUELY-DEPOSITED AMORPHOUS GE-SE FILMS BY XPS

被引：11

|

作者：

UENO, T

ODAJIMA, A

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 09期

关键词：

D O I：

10.1143/JJAP.19.L519

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：L519 / L522

页数：4

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