STUDY OF PHOTOINDUCED EFFECT IN OBLIQUELY-DEPOSITED AMORPHOUS GE-SE FILMS BY XPS

被引：11
|
作者：
UENO, T
ODAJIMA, A
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 09期
关键词：
D O I：
10.1143/JJAP.19.L519
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：L519 / L522
页数：4
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