LASER-PHOTOINDUCED ETCHING OF SEMICONDUCTORS AND METALS

被引：34

|

作者：

HAYNES, RW

METZE, GM

KREISMANIS, VG

EASTMAN, LF

机构：

来源：

APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 04期

关键词：

D O I：

10.1063/1.91941

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：344 / 346

页数：3

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