LASER-PHOTOINDUCED ETCHING OF SEMICONDUCTORS AND METALS

被引：34
|
作者：
HAYNES, RW
METZE, GM
KREISMANIS, VG
EASTMAN, LF
机构：
来源：
APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 04期
关键词：
D O I：
10.1063/1.91941
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：344 / 346
页数：3
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