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- [1] STRUCTURAL AND ELECTRICAL PROPERTIES OF TANTALUM FILMS SPUTTERED IN OXYGEN-ARGON MIXTURESJOURNAL OF APPLIED PHYSICS, 1971, 42 (07) : 2946 - +WESTWOOD, WDWATERHOUSE, N
- [2] STRUCTURAL AND ELECTRICAL PROPERTIES OF RF MAGNETRON SPUTTERED TANTALUM OXIDE FILMSINTERNATIONAL JOURNAL OF NANOSCIENCE, 2011, 10 (4-5) : 749 - 753Chandra, S. V. JagadeeshPark, D. S.Uthanna, S.Choi, Chel-JongReddy, A. Guruva
- [3] EFFECT OF OXYGEN ON ELECTRICAL AND STURCTURAL PROPERTIES OF TRIODE-SPUTTERED TANTALUM FILMSJOURNAL OF APPLIED PHYSICS, 1971, 42 (13) : 5649 - &WATERHOU.NWILCOX, PSWILLMOTT, DJ
- [4] EFFECT OF OXYGEN ON TEMPERATURE DEPENDENCE OF ELECTRICAL PROPERTIES OF REACTIVELY SPUTTERED TANTALUM FILMSCANADIAN JOURNAL OF PHYSICS, 1971, 49 (17) : 2250 - +WATERHOUSE, NWESTWOOD, WD
- [5] ELECTRICAL AND STRUCTURAL PROPERTIES OF CO-SPUTTERED TANTALUM-ALUMINUM FILMSJOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04): : 694 - &STEIDEL, CA
- [6] VARIATION WITH DEPT OF ELECTRICAL PROPERTIES OF SPUTTERED TANTALUM FILMSJOURNAL OF APPLIED PHYSICS, 1972, 43 (04) : 1498 - &WATERHOU.N
- [7] RF SPUTTERED TANTALUM FILMS DEPOSITED IN AN OXYGEN DOPED ATMOSPHERETHIN SOLID FILMS, 1970, 6 (05) : R57 - &BAKER, PN
- [8] RF SPUTTERED TANTALUM FILMS DEPOSITED IN AN OXYGEN DOPED ATMOSPHERETHIN SOLID FILMS, 1971, 8 (01) : R1 - +WESTWWOD, WDLIVERMORE, FC
- [9] Structural and electrical properties of magnetron sputtered Ti(ON) thin films: The case of TiN doped in situ with oxygenJOURNAL OF POWER SOURCES, 2009, 194 (01) : 93 - 103Trenczek-Zajac, A.Radecka, M.Zakrzewska, K.Brudnik, A.Kusior, E.Bourgeois, S.de Lucas, M. C. MarcoImhoff, L.
- [10] EFFECT OF NITROGEN ON THE ELECTRICAL AND STRUCTURAL PROPERTIES OF TRIODE-SPUTTERED TANTALUM FILMS.1600, (43):Willmott, David J.