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- [1] SILICON DIOXIDE FILMS DOPED WITH PHOSPHORUSJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (04) : 399 - &MIURA, YTANAKA, SMATUKURA, YOSAFUNE, H
- [2] HIGH-TEMPERATURE DEPOSITION AND EVALUATION OF PHOSPHORUS-DOPED OR BORON-DOPED SILICON DIOXIDE FILMSJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (02) : 313 - 319ADAMS, ACCAPIO, CDHASZKO, SEPARISI, GIPOVILONIS, EIROBINSON, M
- [3] DEPOSITION OF PHOSPHORUS DOPED SILICON FILMS BY THERMAL-DECOMPOSITION OF DISILANEJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1984, 23 (07): : L493 - L495NAKAYAMA, SYONEZAWA, HMUROTA, J
- [4] Deposition and Properties of Sputtered Phosphorus Doped Amorphous Silicon Films for Passivating ContactsSILICONPV 2022, THE 12TH INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS, 2023, 2826Baumann, JensSchneiderloechner, EricPolzin, Jana-IsabelleFeldmann, FrankBivour, MartinHermle, Martin
- [5] PLANARIZATION OF PHOSPHORUS-DOPED SILICON DIOXIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C372 - C372ADAMS, ACCAPIO, CD
- [6] PLANARIZATION OF PHOSPHORUS-DOPED SILICON DIOXIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (02) : 423 - 429ADAMS, ACCAPIO, CD
- [7] Plasma enhanced chemical vapor deposition and characterization of fluorine doped silicon dioxide filmsJapanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1997, 36 (1 A): : 267 - 275Yoo, Woo SikSwope, RichardMordo, David
- [8] CHEMICAL VAPOR DEPOSITION OF DOPED AND UNDOPED SILICON DIOXIDE FILMS USING A HORIZONTAL SYSTEMJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (08) : C289 - &SWANSON, TBHULL, R
- [9] Plasma enhanced chemical vapor deposition and characterization of fluorine doped silicon dioxide filmsJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (1A): : 267 - 275Yoo, WSSwope, RMordo, D
- [10] DEPOSITION OF SILICON DIOXIDE FILMS AT REDUCED PRESSUREJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (06) : 1042 - 1046ADAMS, ACCAPIO, CD