OBSERVATION OF FINE PARTICLES IN HOMOEPITAXIAL SILICON LAYERS BY TEM TECHNIQUE

被引：0
|
作者：
RUPNIEWSKI, W [1 ]
WOJCIK, MS [1 ]
机构：
[1] SEMICOND MAT RES & PROD CTR,PL-02673 WARSAW,POLAND
来源：
ACTA CRYSTALLOGRAPHICA SECTION A | 1978年 / 34卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：S259 / S260
页数：2
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