SILICON SUPPORTED EB PROXIMITY MASKS

被引：0
|
作者：
BOHLEN, H [1 ]
GRESCHNER, J [1 ]
NEHMIZ, P [1 ]
机构：
[1] IBM DEUTSCHLAND,D-7032 SINDEFINGEN,FED REP GER
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C157 / C158
页数：2
相关论文
共 50 条
  • [41] In situ submicron patterning with silicon nitride evaporation masks
    Purbach, U
    de Lozanne, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06): : 2073 - 2076
  • [42] Preparation of high silicon steel by EB-PVD
    Li, X.
    He, X. D.
    Li, Y.
    Sun, Y.
    2006 BIMW: 2006 BEIJING INTERNATIONAL MATERIALS WEEK, PTS 1-4: MAGNESIUM, 2007, 546-549 : 1813 - +
  • [43] Silicon evaluation of logic proximity bridge patterns
    Tran, Eric N.
    Kasulasrinivas, Vishwashanth
    Chakravarty, Sreejit
    24TH IEEE VLSI TEST SYMPOSIUM, PROCEEDINGS, 2006, : 78 - 83
  • [44] Proximity gettering of platinum in proton irradiated silicon
    Schmidt, DC
    Svensson, BG
    Keskitalo, N
    Godey, S
    Ntsoenzok, E
    Barbot, JF
    Blanchard, C
    JOURNAL OF APPLIED PHYSICS, 1998, 84 (08) : 4214 - 4218
  • [45] Adenomatous polyposis coli and EB1 localize in close proximity of the mother centriole and EB1 is a functional component of centrosomes
    Louie, RK
    Bahmanyar, S
    Siemers, KA
    Votin, V
    Chang, P
    Stearns, T
    Nelson, WJ
    Barth, AIM
    JOURNAL OF CELL SCIENCE, 2004, 117 (07) : 1117 - 1128
  • [46] Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization
    Puthankovilakam, Krishnaparvathy
    Scharf, Toralf
    Tan, Qing
    Herzig, Hans Peter
    Nguyen, David
    Vogler, Uwe
    Bramati, Arianna
    Voelkel, Reinhard
    INTERFEROMETRY XVII: TECHNIQUES AND ANALYSIS, 2014, 9203
  • [47] Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks
    Lu, B
    Wasson, JR
    Weisbrod, EJ
    Masnyj, Z
    Mangat, PJS
    Nordquist, K
    Resnick, D
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 3029 - 3034
  • [48] Modelling the EB-PVD thermal barrier coating process: Component clusters and shadow masks
    Loureiro da Silva Pereira, Vitor Emanuel de Matos
    Nicholls, John Rayment
    Newton, Rachel
    SURFACE & COATINGS TECHNOLOGY, 2017, 311 : 307 - 313
  • [49] Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography
    Stuerzebecher, Lorenz
    Harzendorf, Torsten
    Fuchs, Frank
    Zeitner, Uwe D.
    ADVANCED FABRICATION TECHNOLOGIES FOR MICRO/NANO OPTICS AND PHOTONICS V, 2012, 8249
  • [50] High resolution proximity printing by wave-optically designed complex transmission masks
    Bühling, S
    Wyrowski, F
    Kley, EB
    Nellissen, AJM
    Wang, LL
    Dirkzwager, M
    LITHOGRAPHY FOR SEMICONDUCTOR MANUFACTURING II, 2001, 4404 : 221 - 230
12345