HYDROGEN ANALYSIS IN HYDROGENATED AMORPHOUS-SILICON THIN-FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING

被引：2

作者：

ABABOU, N

BELDI, N

MOHAMMEDBRAHIM, T

机构：

来源：

MATERIALS CHEMISTRY AND PHYSICS | 1993年 / 33卷 / 3-4期

关键词：

D O I：

10.1016/0254-0584(93)90066-U

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An analysis of hydrogen incorporated into hydrogenated amorphous silicon (a-Si:H) thin films is reported. These films have been deposited by d.c. magnetron sputtering in a reactive hydrogen-argon mixture. The hydrogen incorporated in the films is studied by ERD and IR spectroscopy in order to determine the hydrogen content and hydrogen bonding configurations, respectively.

引用

页码：221 / 224

页数：4

共 50 条

[1] HYDROGENATED AMORPHOUS-SILICON FILMS DEPOSITED BY DC PLANAR MAGNETRON REACTIVE SPUTTERING
PINARBASI, M
CHOU, LH
MALEY, N
MYERS, A
LEET, D
THORNTON, JA
[J]. SUPERLATTICES AND MICROSTRUCTURES, 1987, 3 (04) : 331 - 340
[2] HYDROGENATED AMORPHOUS-SILICON FILMS PRODUCED BY DC MAGNETRON TECHNIQUE
KOLODZIEJ, A
LEJA, E
[J]. ACTA PHYSICA POLONICA A, 1987, 71 (03) : 497 - 499
[3] HYDROGENATED AMORPHOUS-SILICON THIN-FILMS DEPOSITED BY TRIODE ASSISTED REACTIVE SPUTTERING
SOUKUP, RJ
KANTOR, KJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 1728 - 1733
[4] HYDROGENATED AMORPHOUS-SILICON THIN-FILMS PRODUCED BY ION PLATING
COCKS, FH
SCHARMAN, AJ
JONES, PL
COGAN, SF
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (11) : 909 - 910
[5] ALNX THIN-FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING
SVUB, J
MUSIL, J
[J]. CZECHOSLOVAK JOURNAL OF PHYSICS, 1985, 35 (10) : 1191 - 1192
[6] THE INFLUENCE OF DEPOSITION PARAMETERS ON THE PROPERTIES OF AMORPHOUS-SILICON THIN-FILMS PRODUCED BY THE MAGNETRON SPUTTERING METHOD
BATABYAL, AK
CHAUDHURI, P
RAY, S
BARUA, AK
[J]. THIN SOLID FILMS, 1984, 112 (01) : 51 - 59
[7] DIFFUSION AND EFFUSION ANALYSIS OF HYDROGEN IN UNDOPED HYDROGENATED AMORPHOUS-SILICON THIN-FILMS
LOPEZ, F
ANDUJAR, JL
MORENZA, JL
GARCIACUENCA, MV
[J]. APPLIED SURFACE SCIENCE, 1993, 70-1 (1 -4 pt B) : 680 - 685
[8] DEPTH PROFILES OF HYDROGEN AND OXYGEN IN HYDROGENATED AMORPHOUS-SILICON THIN-FILMS
SIE, SH
MCKENZIE, DR
SMITH, GB
RYAN, CG
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 15 (1-6): : 525 - 529
[9] REACTIVE UNBALANCED MAGNETRON SPUTTERING OF HYDROGENATED AMORPHOUS-SILICON AND SILICON-OXIDE
HALL, GW
HOWSON, RP
CHEW, A
[J]. VACUUM, 1993, 44 (3-4) : 227 - 230
[10] 1/F NOISE IN AMORPHOUS-SILICON AND HYDROGENATED AMORPHOUS-SILICON THIN-FILMS
BACIOCCHI, M
DAMICO, A
VANVLIET, CM
[J]. SOLID-STATE ELECTRONICS, 1991, 34 (12) : 1439 - 1447

← 1 2 3 4 5 →