DETECTION AND PRINTABILITY OF SHIFTER DEFECTS IN PHASE-SHIFTING MASKS

被引:8
|
作者
WATANABE, H
TODOKORO, Y
INOUE, M
机构
[1] Kyoto Research Laboratory, Matsushita Electronics Corporation, Minami-ku, Kyoto, 601, 19, Nishikujo-Kasugacho
关键词
OPTICAL LITHOGRAPHY; PHASE-SHIFTING MASK; SHIFTER DEFECT; MASK INSPECTION; DEFECT PRINTABILITY;
D O I
10.1143/JJAP.30.3016
中图分类号
O59 [应用物理学];
学科分类号
摘要
Because of the high printability of shifter defects in phase-shifting masks, it is worthwhile to characterize the inspection and printing of the shifter defects. The detectability and printability of shifter defects as a function of size and location have been investigated by experiments and simulation. A test mask with various programmed shifter defects was inspected by means of a die-to-die inspection system and printed in positive resist with an i-line stepper. Corner defects are difficult to detect and have low printability. A defect located in small features has high printability. We have also investigated the detectability and printability of the phase angle defects which have phase angles other than 180-degrees. Defects with 120-degrees to 180-degrees phase angles have high printability. Defects with phase angles below 90-degrees are not printed.
引用
收藏
页码:3016 / 3020
页数:5
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